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Journal of Micro-Nanolithography MEMS and MOEMS

SCIE
期刊ISSN:1932-5150
大类研究方向:工程技术
影响因子:1.193
数据库类型:SCIE
是否OA:No
出版地:UNITED STATES
年文章数:77
小类研究方向:工程技术-工程:电子与电气
审稿速度:较慢,6-12周
平均录用比例:容易

官方网站:http://www.spie.org/publications/journals/journal-of-micro/nanolithography-mems-and-moems

投稿网址:https://jm3.msubmit.net/cgi-bin/main.plex

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Journal of Micro-Nanolithography MEMS and MOEMS 英文简介

The Journal of Micro-Nanolithography MEMS and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.

Journal of Micro-Nanolithography MEMS and MOEMS 中文简介

《微纳米光刻机MEMS和MOEMS杂志》(JM3)发表了有关光刻、制造、包装和集成技术的科学、发展和实践的论文,以满足电子、MEMS、MOEMS和光子学行业的需要。这类装置的范围很广,包括生物医学微装置、微流体、传感器和执行器、自适应光学和数字微镜。范围广泛,有助于促进期刊服务的社区之间的协同作用和利益。

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