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Recent Patents on Nanotechnology

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Recent Patents on Nanotechnology
杂志名称:纳米技术的最新专利
简称:RECENT PAT NANOTECH
期刊ISSN:1872-2105
大类研究方向:工程技术
影响因子:1.75
数据库类型:SCIE
是否OA:No
出版地:U ARAB EMIRATES
年文章数:23
小类研究方向:工程技术-材料科学:综合
审稿速度:约3.0个月
平均录用比例:容易

官方网站:http://benthamscience.com/journal/index.php?journalID=rpnanotec

投稿网址:http://bsp-cms.eurekaselect.com/index.php/NANOTEC/login?source=%2Findex.php%2FNANOTEC

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Recent Patents on Nanotechnology

英文简介

Recent Patents on Nanotechnology publishes full-length/mini reviews and research articles that reflect or deal with studies in relation to a patent, application of reported patents in a study, discussion of comparison of results regarding application of a given patent, etc., and also guest edited thematic issues on recent patents in the field of nanotechnology. A selection of important and recent patents on nanotechnology is also included in the journal. The journal is essential reading for all researchers involved in nanotechnology.

Recent Patents on Nanotechnology

中文简介

最近纳米技术专利发表长篇/迷你评论和研究文章,反映或处理研究与专利,申请专利报道的研究中,讨论的比较结果对于一个给定的应用专利,等等,还有客人编辑主题问题最近在纳米技术领域的专利。该杂志还收录了一些重要的和最新的纳米技术专利。该杂志是所有涉及纳米技术的研究人员的必读书。

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